A detailed experimental and analytical study of the thermal expansion of dielectric thin films on Si by x-ray reflectivity

被引：0
|
作者：
Phung, T.M. [4 ]
Johnson, D.C. [1 ,2 ]
Antonelli, G.A. [3 ,4 ]
机构：
[1] Materials Science Institute, University of Oregon, Eugene, OR 97403
[2] Department of Chemistry, University of Oregon, Eugene, OR 97403
[3] Intel Corporation, Portland Technology Development, Hillsboro, OR 97124
[4] Physics Department, Brown University, Providence, RI 02912
来源：
Journal of Applied Physics | 2006年 / 100卷 / 06期
关键词：
Thin films;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Journal article (JA)
引用
收藏
相关论文
共 50 条
  • [1] A detailed experimental and analytical study of the thermal expansion of dielectric thin films on Si by x-ray reflectivity
    Phung, T. M.
    Johnson, D. C.
    Antonelli, G. A.
    JOURNAL OF APPLIED PHYSICS, 2006, 100 (06)
  • [2] Thermal expansion of low dielectric constant thin films by high-resolution x-ray reflectivity
    Omote, K
    Ito, Y
    Thin Films Stresses and Mechanical Properties XI, 2005, 875 : 223 - 228
  • [3] X-ray reflectivity study of thin organic films
    Basu, JK
    Sanyal, MK
    Datta, A
    RADIATION PHYSICS AND CHEMISTRY, 1998, 51 (4-6) : 541 - 542
  • [4] Thermal expansion coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity
    Bouldin, CE
    Wallace, WE
    Lynn, GW
    Roth, SC
    Wu, WL
    JOURNAL OF APPLIED PHYSICS, 2000, 88 (02) : 691 - 695
  • [5] Anomalous X-ray reflectivity study of metal oxide thin films
    Pohang Univ of Science and, Technology, Pohang, Korea, Republic of
    Appl Surf Sci, 1-2 (41-45):
  • [6] Anomalous X-ray reflectivity study of metal oxide thin films
    Banerjee, S
    Park, YJ
    Lee, DR
    Jeong, YH
    Lee, KB
    Yoon, SB
    Choi, HM
    Park, JC
    Roh, JS
    Sanyal, MK
    APPLIED SURFACE SCIENCE, 1998, 136 (1-2) : 41 - 45
  • [7] X-ray reflectivity study of the glass transition temperature of thin films
    Stoev, K.
    Sakurai, K.
    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 2014, 70 : C885 - C885
  • [8] X-ray diffraction and X-ray reflectivity applied to investigation of thin films
    Rafaja, D
    ADVANCES IN SOLID STATE PHYSICS 41, 2001, 41 : 275 - 286
  • [9] Synchrotron X-ray reflectivity studies on nanoporous low dielectric constant organosilicate thin films
    Oh, Weontae
    Yeong, Do Park
    Hwang, Yongtaek
    Ree, Moonhor
    Bulletin of the Korean Chemical Society, 2007, 28 (12) : 2481 - 2485
  • [10] Soft x-ray resonant magnetic reflectivity study of thin films and multilayers
    Tonnerre, JM
    Sève, L
    Barbara-Dechelette, A
    Bartolomé, F
    Raoux, D
    Chakarian, V
    Kao, CC
    Fischer, H
    Andrieu, S
    Fruchart, O
    JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) : 6293 - 6295
12345