Microfabrication of silicon using self-assembled monolayer resist and metastable helium beam

被引：0
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作者：
Zhang, Jianwu [1 ,2 ]
Kurahashi, Mitsunori [1 ]
Suzuki, Taku [1 ,3 ]
Sun, Xia [1 ,2 ]
Yamauchi, Yasushi [1 ]
机构：
[1] National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
[2] Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, China
[3] PRESTO, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2006年 / 45卷 / 10 A期
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摘要：
Journal article (JA)
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页码：8020 / 8023
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