Femtosecond-laser-assisted wet chemical etching of polymer materials

被引：0
|
作者：
Wochnowski, C. [1 ]
Hanada, Y. [2 ]
Cheng, Y. [2 ]
Metev, S. [1 ]
Vollertsen, F. [1 ]
Sugioka, K. [2 ]
Midorikawa, K. [2 ]
机构：
[1] BIAS (Bremer Institut für Angewandte Strahltechnik), 28359 Bremen, Germany
[2] RIKEN (The Institute of Physical and Chemical Research), Wako, Saitama 351-0198, Japan
来源：
Journal of Applied Polymer Science | 2006年 / 100卷 / 02期
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页码：1229 / 1238
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