Evaluation of soft x-ray multilayer optics using synchrotron radiation

[1] Barbee Jr. T.W., Mrowka S., Hettrick M.C., Molybdenum-silicon multilayer mirrors for the extreme ultraviolet, AppL Opt., 24, 6, (1985)

[2] Bridges J.M., Cromer C.L., Mcllrath T.J., Investigation of a laser-produced plasma vuv light source, Appl. Opt., 25, 13, (1986)

[3] Larruquert J.I., Keski-Kuha R.A.M., Appl. Opt., 41, 25, (2002)

[4] Hatano T., Aihara S., Monochromator operation in the carbon window region at the reflectometry beamline bl-11d of the photon factory, J. Phys.: Conf. Series., 425, (2013)

[5] Hatano T., Aihara S., Uchida K., Tsuru T., Performance of the post-focusing mirror system at the reflectometry beamline bl-11d of the photon factory, J. Phys. : Conf. Series., 463, (2013)

[6] Kinoshita H., Watanabe T., Harada T., Nagata Y., Recent activities on extreme ultraviolet lithography in newsubaru, Jpn J. Appl. Phys., 52, (2013)

[7] Takenaka H., Ichimaru S., Gullikson E.M., Development of beam splitters for euv region, IPAP Conf. Series., 7, (2006)

[8] Ejima T., Ishida F., Murata H., Toyoda M., Harada T., Tsuru T., Hatano T., Yanagihara M., Yamamoto M., Mizutani H., High throughput and wide field of view euv microscope for blur-free one-shot imaging of living organisms, Optics Express, 18, 7, (2010)

[9] Hatano T., Kubota S., Adachi Y., Tsuru T., Yamamoto M., Normal incidence reflectometry of concave multilayer mirrors using synchrotron radiation to evaluate the period thickness distribution, AIP, Proa., 705, (2004)

[10] Yamamoto M., Sub-nm figure error correction of an euv multilayer mirror by its surface milling, Nucl. Instrum. Meth. Phys. Res. A., 467-468, (2001)

[1] Barbee Jr. T.W., Mrowka S., Hettrick M.C., Molybdenum-silicon multilayer mirrors for the extreme ultraviolet, AppL Opt., 24, 6, (1985)

[2] Bridges J.M., Cromer C.L., Mcllrath T.J., Investigation of a laser-produced plasma vuv light source, Appl. Opt., 25, 13, (1986)

[3] Larruquert J.I., Keski-Kuha R.A.M., Appl. Opt., 41, 25, (2002)

[4] Hatano T., Aihara S., Monochromator operation in the carbon window region at the reflectometry beamline bl-11d of the photon factory, J. Phys.: Conf. Series., 425, (2013)

[5] Hatano T., Aihara S., Uchida K., Tsuru T., Performance of the post-focusing mirror system at the reflectometry beamline bl-11d of the photon factory, J. Phys. : Conf. Series., 463, (2013)

[6] Kinoshita H., Watanabe T., Harada T., Nagata Y., Recent activities on extreme ultraviolet lithography in newsubaru, Jpn J. Appl. Phys., 52, (2013)

[7] Takenaka H., Ichimaru S., Gullikson E.M., Development of beam splitters for euv region, IPAP Conf. Series., 7, (2006)

[8] Ejima T., Ishida F., Murata H., Toyoda M., Harada T., Tsuru T., Hatano T., Yanagihara M., Yamamoto M., Mizutani H., High throughput and wide field of view euv microscope for blur-free one-shot imaging of living organisms, Optics Express, 18, 7, (2010)

[9] Hatano T., Kubota S., Adachi Y., Tsuru T., Yamamoto M., Normal incidence reflectometry of concave multilayer mirrors using synchrotron radiation to evaluate the period thickness distribution, AIP, Proa., 705, (2004)

[10] Yamamoto M., Sub-nm figure error correction of an euv multilayer mirror by its surface milling, Nucl. Instrum. Meth. Phys. Res. A., 467-468, (2001)