Sintering condition and microstructure of translucent silicon nitride ceramics

被引：0

作者：

Hojo, Junichi ^{[1
]}

Yang, Wenwu ^{[2
]}

Inada, Miki ^{[1
]}

Tanaka, Yumi ^{[1
]}

Enomoto, Naoya ^{[1
]}

机构：

[1] Dept. Applied Chemistry, Faculty of Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka

[2] Dept. Chemistry and Biochemistry, Graduate School of Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka

来源：

Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy | 2014年 / 61卷 / 12期

关键词：

Sialon; Silicon nitride; Sintering aid; Spark plasma sintering; Translucency;

D O I：

10.2497/jjspm.61.575

中图分类号：

学科分类号：

摘要：

Translucent Si3N4 ceramics are expected to use for a special optical application in high temperature and corrosive environment owing to its high mechanical strength and thermal and chemical stability. To achieve the translucency of Si3N4 ceramics, fine-grained microstructure with an appropriate sintering aid is important to reduce light scattering. The Si3N4 ceramics were fabricated by spark-plasma sintering (SPS) with AlN-MgO additive. Fine α-Si3N4 powder with high purity was useful to obtain translucent Si3N4 sintered body. When the additive content was large, α-SiAlON formed, whereas β3-Si3N4 formed at a small additive content, revealing the high translucency of both phases in visible light region. The AlN/MgO ratio should be on the SiAlON forming line (AlN/MgO = 3/1) in Si3N4-AlN-MgO phase diagram. The short-time sintering at high temperature (1850 °C, 5 min) by SPS was effective to obtain the dense and fine-grained microstructure, and the transmittance of 22∼28% at the wavelength of 900 nm was achieved under the optimal conditions.

引用

页码：575 / 581

页数：6

共 12 条

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