Thermal management of hybrid silicon ring lasers for high temperature operation

被引：0
|
作者：
Zhang, Chong [1 ,2 ]
Liang, Di [1 ]
Kurczveil, Geza [1 ]
Bowers, John E. [2 ]
Beausoleil, Raymond G. [1 ]
机构：
[1] Systems Research Laboratory, Hewlett-Packard Laboratories, Palo Alto,CA,94304, United States
[2] Department of Electrical Engineering, University of California, Santa Barbara,CA,93106, United States
来源：
HP Laboratories Technical Report | 2015年 / 40期
关键词：
Continuous wave lasing - High temperature - Hybrid silicon - Lasing performance - Micro-ring lasers - Thermal impedance - Thermal shunt;
D O I：
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学科分类号：
摘要：
We discuss the thermal management of microring lasers on hybrid silicon platform in order to optimize their high-temperature lasing performance. The thermal impedance of microring lasers was improved with a novel thermal shunt design. We report a significant improvement of hybrid silicon microring laser performance, with the maximum continuous wave lasing stage temperature up to 105 °C. © Copyright 2015 Hewlett-Packard Development Company, L.P.
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页码：1 / 7
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