Electrodeposition of copper thin films from 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide

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[1] [1,Liu, Tomin
[2] Vilar, Rui
[3] Eugénio, Sónia
[4] Grondin, Joseph
[5] Danten, Yann
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Liu, Tomin | 1600年 / Kluwer Academic Publishers卷 / 45期
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