Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy

被引：0
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作者：
Stolz, A. [1 ]
Soltani, A. [1 ]
Abdallah, B. [2 ]
Charrier, J. [3 ]
Deresmes, D. [1 ]
Jouan, P.-Y. [4 ]
Djouadi, M.A. [4 ]
Dogheche, E. [1 ]
De Jaeger, J.-C. [1 ]
机构：
[1] Institut d'Electronique de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, Université Nord de France, Avenue Poincaré, 59652 Villeneuve d'Ascq Cedex, France
[2] Department of Materials Physics, Atomic Energy Commission of Syria, P.O. Box 6091, Damascus, Syria
[3] Fonctions Optiques Pour les Technologies de l'Information (FOTON), UMR CNRS 6082, 6, rue de Kerampont, CS 80518, 22305 Lannion Cedex, France
[4] Institut des Matériaux Jean Rouxel - IMN, UMR CNRS 6502, 2, rue de la Houssinère, 44322 Nantes, France
来源：
Thin Solid Films | 2013年 / 535卷 / 01期
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页码：442 / 445
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