A radio-frequency nonequilibrium atmospheric pressure plasma operating with argon and oxygen

被引：0
|
作者：
Moravej, M. [1 ]
Yang, X. [1 ]
Hicks, R.F. [1 ]
Penelon, J. [2 ]
Babayan, S.E. [2 ]
机构：
[1] Chemical Engineering Department, University of California, Los Angeles, CA 90095
[2] Surfx Technologies LLC, 3617 Hayden Avenue, Culver City, CA 90232
来源：
Journal of Applied Physics | 2006年 / 99卷 / 09期
关键词：
A capacitively coupled; atmospheric pressure plasma has been developed that produces a high concentration of reactive species at a gas temperature below 300 °C. The concentration of ground-state oxygen atoms produced by the discharge was measured by NO titration; and found to equal 1.2 vol %; or; 1.2±0.4×; 1017; cm-3; using 6.0 vol % O2 in argon at 150 W cm3. The ozone concentration determined at the same conditions was 4.3±0.5× 1014 cm-3. A model of the gas phase reactions was developed and yielded O atom and O3 concentrations in agreement with experiment. This plasma source etched Kapton&reg at 5.0 μms at 280 °C and an electrode-to-sample spacing of 1.5 cm. This fast etch rate is attributed to the high O atom flux generated by the plasma source. © 2006 American Institute of Physics;
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