A radio-frequency nonequilibrium atmospheric pressure plasma operating with argon and oxygen

被引：0

作者：

Moravej, M. ^{[1
]}

Yang, X. ^{[1
]}

Hicks, R.F. ^{[1
]}

Penelon, J. ^{[2
]}

Babayan, S.E. ^{[2
]}

机构：

[1] Chemical Engineering Department, University of California, Los Angeles, CA 90095

[2] Surfx Technologies LLC, 3617 Hayden Avenue, Culver City, CA 90232

来源：

Journal of Applied Physics | 2006年 / 99卷 / 09期

关键词：

A capacitively coupled; atmospheric pressure plasma has been developed that produces a high concentration of reactive species at a gas temperature below 300 °C. The concentration of ground-state oxygen atoms produced by the discharge was measured by NO titration; and found to equal 1.2 vol %; or; 1.2±0.4×; 1017; cm-3; using 6.0 vol % O2 in argon at 150 W cm3. The ozone concentration determined at the same conditions was 4.3±0.5× 1014 cm-3. A model of the gas phase reactions was developed and yielded O atom and O3 concentrations in agreement with experiment. This plasma source etched Kapton&reg at 5.0 μms at 280 °C and an electrode-to-sample spacing of 1.5 cm. This fast etch rate is attributed to the high O atom flux generated by the plasma source. © 2006 American Institute of Physics;

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摘要：

Journal article (JA)

引用

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