Photo-curable resins and the evaluation methods for UV-nanoimprint lithograohy

被引：2
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作者：
Toyo Gosei Co., LTD., 4-2-1 wakahagi, Inba-gun, Inba-mura, Chiba 270-1609, Japan [1 ]
不详 [2 ]
不详 [3 ]
不详 [4 ]
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来源：
IEEJ Trans. Electron. Inf. Syst. | 2007年 / 2卷 / 174-178期
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D O I：
10.1541/ieejeiss.127.174
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