High-temperature growth of Cu2O crystals via mist chemical vapor deposition on Si (111) substrates

被引：0
作者：
Sasaki, Togi [1 ]
Kobayashi, Shuto [1 ]
Kouno, Tetsuya [1 ]
机构：
[1] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 4328561, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2024年 / 63卷 / 12期
关键词：
mist-CVD; Cu2O; crystal growth; THIN-FILMS; LAYERS;
D O I：
10.35848/1347-4065/ad9b60
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Cuprous oxide (Cu2O) crystals were grown on Si(111) substrates at a high temperature of approximately 960 degrees C using mist chemical vapor deposition (mist-CVD) by varying the mist carrier gas parameters. The mist-CVD process has a potentially low environmental impact and low cost due to the absence of a vacuum system and the use of low-toxic raw materials. The as-grown crystals were evaluated using X-ray diffraction, Raman spectroscopy, and scanning electron microscopy. Based on these results, the mixture ratio of the mist carrier gas is significant for realizing Cu2O crystal growth.
引用
收藏
页数：3
相关论文
共 36 条
  • [1] Thin film deposition of Cu2O and application for solar cells
    Akimoto, K.
    Ishizuka, S.
    Yanagita, M.
    Nawa, Y.
    Paul, Goutam K.
    Sakurai, T.
    [J]. SOLAR ENERGY, 2006, 80 (06) : 715 - 722
  • [2] Epitaxial growth of Cu2O and ZnO/Cu2O thin films on MgO by plasma-assisted molecular beam epitaxy
    Darvish, Davis S.
    Atwater, Harry A.
    [J]. JOURNAL OF CRYSTAL GROWTH, 2011, 319 (01) : 39 - 43
  • [3] Cu2O films without impurities fabricated via the mist spin spray technique using a mixed alkaline solution for flexible glucose sensors
    Fujita, Yutaka
    Yamasaki, Atsuko
    Nitta, Ryosuke
    Kubota, Yuta
    Katayanagi, Yuta
    Matsushita, Nobuhiro
    [J]. THIN SOLID FILMS, 2023, 787
  • [4] Hole mobility improvement in Cu2O thin films prepared by the mist CVD method
    Ikenoue, Takumi
    Kawai, Toshikazu
    Wakashima, Ryo
    Miyake, Masao
    Hirato, Tetsuji
    [J]. APPLIED PHYSICS EXPRESS, 2019, 12 (05)
  • [5] Epitaxial growth of undoped and Li-doped NiO thin films on α-Al2O3 substrates by mist chemical vapor deposition
    Ikenoue, Takumi
    Inoue, Junki
    Miyake, Masao
    Hirato, Tetsuji
    [J]. JOURNAL OF CRYSTAL GROWTH, 2019, 507 : 379 - 383
  • [6] Fabrication and characteristics of p-type Cu2O thin films by ultrasonic spray-assisted mist CVD method
    Ikenoue, Takumi
    Sakamoto, Shin-ichi
    Inui, Yoshitaka
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (05)
  • [7] Pure deep-ultraviolet cathodoluminescence from rocksalt-structured MgZnO grown with carbon-free precursors
    Ishii, Kyohei
    Ono, Mizuki
    Kaneko, Kentaro
    Onuma, Takeyoshi
    Honda, Tohru
    Fujita, Shizuo
    [J]. APPLIED PHYSICS EXPRESS, 2019, 12 (05)
  • [8] Photoluminescence properties and random lasing behaviors of mist-CVD-grown ZnO disordered nanocrystals on c-plane sapphire substrate
    Iwata, Junichi
    Sakai, Masaru
    Ohashi, Kosei
    Hara, Kazuhiko
    Kouno, Tetsuya
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2021, 60 (10)
  • [9] Heteroepitaxial growth of Cu2O thin film on ZnO by metal organic chemical vapor deposition
    Jeong, SeongHo
    Aydil, Eray S.
    [J]. JOURNAL OF CRYSTAL GROWTH, 2009, 311 (17) : 4188 - 4192
  • [10] Growth of rocksalt-structured MgxZn1-xO (x > 0.5) films on MgO substrates and their deep-ultraviolet luminescence
    Kaneko, Kentaro
    Onuma, Takeyoshi
    Tsumura, Keiichi
    Uchida, Takayuki
    Jinno, Riena
    Yamaguchi, Tomohiro
    Honda, Tohru
    Fujita, Shizuo
    [J]. APPLIED PHYSICS EXPRESS, 2016, 9 (11)
1234