A comparative study of Si-C-N films on different substrates grown by RF magnetron sputtering

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作者：
Bhattacharyya, A.S. [1 ,2 ]
Mishra, S.K. [1 ]
Mukherjee, S. [2 ]
Das, G.C. [2 ]
机构：
[1] National Metallurgical Laboratory, Jamshedpur, 831007, India
[2] Jadavpur University, Kolkata, 700032, India
来源：
Journal of Alloys and Compounds | 2009年 / 478卷 / 1-2期
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页码：474 / 478
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