Fabrication of Ti-Ni shape memory alloy films by unbalanced magnetron sputtering and their joule heat induced shape memory behavior

被引：0

作者：

Department of Mechanical and System Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan ^{[1
]}

机构：

来源：

J.Vac. Soc.Japan | 2008年 / 5卷 / 312-315期

关键词：

Nickel alloys - Titanium alloys - Binary alloys - Fabrication - Materials testing apparatus - Taguchi methods - Magnetron sputtering - Tensile testing - Shape optimization;

D O I：

10.3131/jvsj2.51.312

中图分类号：

学科分类号：

摘要：

We have optimized the deposition conditions for fabricating Ti-Ni shape memory films by dc unbalanced magnetron sputtering using Taguchi method. The deposited films were annealed at 600C for 60 min for crystallization and memorization into a fiat shape after dissolving the Cu substrates. These films were subjected to DSC measurements and thermal cycling tests under a constant stress. The Joule heat induced shape memory behavior was also characterized by a specially designed tensile testing machine. The transformation temperature of Ni-rich films was found to be lower than RT. On the other hand, those of Ti-47-49.4 at%Ni films were higher than RT, which means they can be expected to show the shape memory effect at RT. The Ti-47-49.4 at%Ni films showed a perfect shape recovery under a constant stress by Joule heat of less than 0.1 J.

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