Effect of pulse bias voltage on adhesive strength of magnetron sputtering ion plated al coating on depleted uranium surface

被引：0

作者：

Wang, Qing-Fu ^{[1
]}

Xian, Xiao-Bin ^{[1
]}

Liu, Ke-Zhao ^{[1
]}

Liu, Qing-He ^{[1
]}

机构：

[1] China Academy of Engineering Physics, P.O. Box 919-71, Mianyang 621900, China

来源：

Yuanzineng Kexue Jishu/Atomic Energy Science and Technology | 2007年 / 41卷 / 03期

关键词：

Magnetron sputtering;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：268 / 272

共 18 条

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[17] Effect of bias voltage on microstructure and optical properties of Al2O3 thin films prepared by twin targets reactive high power impulse magnetron sputtering
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[18] Determination of synergistic effect between roughness and surface chemistry on cell adhesion of a multilayer Si- Hydroxyapatite coating on Ti6Al4V obtained by magnetron sputtering
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