Effects of humidity and solution age on growth of organosilane self-assembled monolayers

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作者：
Lee, Sunhyung [1 ]
Ishizaki, Takahiro [2 ]
Saito, Nagahiro [3 ,4 ]
Takai, Osamu [5 ]
机构：
[1] Faculty of Engineering, Shinshu University, Wakasato, Nagano 380-8553, Japan
[2] Materials Research Institute for Sustainable Development, National Institute of Advanced Industrial Science and Technology, 2266-98, Anagahora, Shimo-Shidami, Moriyama, Nagoya 463-8560, Japan
[3] Department of Materials, Physics and Energy Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603, Japan
[4] Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603, Japan
[5] EcoTopia Science Institute, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603, Japan
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| 1600年 / Japan Society of Applied Physics卷 / 47期
关键词：
The effect of humidity on the self-organization and growth mechanism of octadecyltrichlorosilane (OTS) monolayers was investigated using an atomic force microscope (AFM); grazing incidence X-ray diffraction (GIXD); and Fourier transform IR spectroscopy (FT-IR). OTS self-assembled monolayers (SAMs) were prepared under humidity ranging from 5 to 80%. Under humidity ranging from 15 to 80%; OTS molecules produced domain structures early in the growth process that grew twodimensionally on SiO2 substrates. Also; the crystalline peaks of the obtained from the GIXD measurement indicated that OTSSAMs prepared under high humidity (15-80%) had grown in a crystalline state. Thus; self-organization occurred under these conditions. However; OTS-SAMs prepared under 5% humidity were in an amorphous structure. OTS-SAMs prepared at high humidity were denser than those prepared at low humidity. The domain size early in the growth process increased in proportion to the solution age. This shows that the reaction rate is governed by the hydrolysis of organosilane. On the other hand; solution age has no great influence on the density of the OTS-SAMs under conditions of more than 50% humidity. © 2008 The Japan Society of Applied Physics;
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