Properties of TiAlCN films prepared by direct current magnetron sputtering

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[1] [1,Zheng, Jian-Yun
[2] Hao, Jun-Ying
[3] 1,Liu, Xiao-Qiang
[4] 1,Gong, Qiu-Yu
[5] Liu, Wei-Min
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Hao, J.-Y. (jyhao@licp.cas.cn) | 2013年 / Science Press卷 / 33期
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