Linear growth kinetics of nanometric silicides in Co/amorphous-Si and Co/CoSi/amorphous-Si thin films

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作者：
Cserháti, C. [1 ]
Balogh, Z. [1 ]
Csik, A. [1 ]
Langer, G.A. [1 ]
Erdélyi, Z. [1 ]
Glodán, Gy. [1 ]
Katona, G.L. [1 ]
Beke, D.L. [1 ]
Zizak, I. [2 ]
Darowski, N. [2 ]
Dudzik, E. [2 ]
Feyerherm, R. [2 ]
机构：
[1] Department of Solid State Physics, University of Debrecen, P. O. Box. 2, H-4010 Debrecen, Hungary
[2] Hahn-Meitner-Institut Berlin, Glienicker Straße 100, D-14109 Berlin, Germany
来源：
Journal of Applied Physics | 2008年 / 104卷 / 02期
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