Effect of nano-patterning on anisotropy of CuNiCu nanolines

被引:0
|
作者
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139 [1 ]
机构
来源
Journal of Applied Physics | 2006年 / 99卷 / 08期
关键词
3;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
相关论文
共 50 条
  • [31] Micro- And Nano-Patterning Using Imprinting Technique
    Lu, Haijing
    Shan, X. C.
    Sun, Yaofeng
    Ng, Sum Huan
    Lu, Albert C. W.
    INTERNATIONAL MEMS CONFERENCE 2006, 2006, 34 : 368 - 372
  • [32] Simultaneous AFM Nano-Patterning and Imaging for Photomask Repair
    Keyvani, Aliasghar
    Tamer, Mehmet S.
    van Es, Maarten H.
    Sadeghian, Hamed
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXX, 2016, 9778
  • [33] Nano-patterning using an embedded particle monolayer as an etch mask
    Nakanishi, T
    Hiraoka, T
    Fujimoto, A
    Saito, S
    Asakawa, K
    MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) : 1503 - 1508
  • [34] Mechanism-dependent resolution for protein micro/nano-patterning
    Nicolau, DV
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2, 2000, 3999 : 472 - 477
  • [35] Effect of nano-patterning of p-GaN cladding layer on photon extraction efficiency
    Hong, Eun-Ju
    Byeon, Kyeong-Jae
    Park, Hyoungwon
    Hwang, Jaeyeon
    Lee, Heon
    Choi, Kyungwoo
    Kim, Hyeong-Seok
    SOLID-STATE ELECTRONICS, 2009, 53 (10) : 1099 - 1102
  • [36] Extreme ultraviolet lasers demonstrate new nano-patterning schemes
    Marconi, M. C.
    Wachulak, P.
    Urbanski, L.
    Menoni, C. S.
    Rocca, J. J.
    Isoyan, A.
    Jiang, F.
    Cheng, Y.
    Cerrina, F.
    2010 23RD ANNUAL MEETING OF THE IEEE PHOTONICS SOCIETY, 2010, : 335 - +
  • [37] Nano-patterning of an iCVD polymer, followed by covalent attachment of QDs
    Lee, Chia-Hua
    Tenhaeff, Wyatt
    Gleason, Karen K.
    THIN SOLID FILMS, 2009, 517 (12) : 3619 - 3621
  • [38] Homogeneous nano-patterning using plasmon-assisted photolithography
    Ueno, Kosei
    Takabatake, Satoaki
    Onishi, Ko
    Itoh, Hiroko
    Nishijima, Yoshiaki
    Misawa, Hiroaki
    APPLIED PHYSICS LETTERS, 2011, 99 (01)
  • [39] Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations
    Namatsu, H
    Yamaguchi, T
    Nagase, M
    Yamazaki, K
    Kurihara, K
    MICROELECTRONIC ENGINEERING, 1998, 42 : 331 - 334
  • [40] Coherent imaging nano-patterning with extreme ultraviolet laser illumination
    Isoyan, A.
    Jiang, F.
    Cheng, Y.
    Wachulak, P.
    Urbanski, L.
    Rocca, J.
    Menoni, C.
    Marconi, M.
    Cerrina, F.
    2009 CONFERENCE ON LASERS AND ELECTRO-OPTICS AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2009), VOLS 1-5, 2009, : 2462 - +