Photoemission study of tris(8-hydroxyquinoline) aluminum/aluminum oxide/tris(8-hydroxyquinoline) aluminum interface

被引：0

作者：

Ding, Huanjun ^{[1
]}

Zorba, Serkan ^{[1
]}

Gao, Yongli ^{[1
]}

Ma, Liping ^{[2
]}

Yang, Yang ^{[2
]}

机构：

[1] Department of Physics and Astronomy, University of Rochester, Rochester, NY 14627, United States

[2] Department of Materials Science and Engineering, University of California, Los Angeles, CA 90095

来源：

Journal of Applied Physics | 2006年 / 100卷 / 11期

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摘要：

Journal article (JA)

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