Photoemission study of tris(8-hydroxyquinoline) aluminum/aluminum oxide/tris(8-hydroxyquinoline) aluminum interface

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作者
Ding, Huanjun [1 ]
Zorba, Serkan [1 ]
Gao, Yongli [1 ]
Ma, Liping [2 ]
Yang, Yang [2 ]
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[1] Department of Physics and Astronomy, University of Rochester, Rochester, NY 14627, United States
[2] Department of Materials Science and Engineering, University of California, Los Angeles, CA 90095
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Journal of Applied Physics | 2006年 / 100卷 / 11期
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