Odd aberration measurement technique based on peak intensity difference of aerial image

被引：0

作者：

机构：

[1] Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences

[2] University of Chinese Academy of Sciences

来源：

Wang, X. (wxz26267@siom.ac.cn) | 1600年 / Chinese Optical Society卷 / 33期

关键词：

Lithographic projection lens; Optical fabrication; Peak intensity difference; Wavefront aberration measurement; Zernike coefficient;

D O I：

10.3788/AOS201333.0512002

中图分类号：

学科分类号：

摘要：

An odd aberration measurement technique based on peak intensity difference of aerial image is proposed for lithographic projection lens. By using the Hopkins theory of partially coherent imaging, the analytical expressions of the aerial image and the peak intensity difference are derived for the double-slit pattern. This technique adopts a double-slit pattern as the measurement mark and the peak intensity difference of aerial image as the measurement parameter. Compared with the odd aberration measurement techniques based on image placement error (IPE), the technique based on the peak intensity difference can reduce the requirement for positioning accuracy of the aerial image, and accurate intensity measurement can improve the odd aberration measurement accuracy effectively. The odd aberration measurement accuracies under conventional illumination and dipole illumination are analyzed with PROLITH software. The simulation results show that the measurement accuracy can be further improved under dipole illumination. Taking coma Z7 as an example, the measurement accuracies are up to 0.29 nm and 0.19 nm under conventional illumination and dipole illumination, respectively.

引用

共 22 条

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