Photoconductive characteristics of hydro-oxygenated amorphous titanium oxide films prepared by remote plasma-enhanced chemical vapor deposition

被引:0
|
作者
Sakaguchi, Koichi [1 ]
Shimakawa, Koichi [2 ]
Hatanaka, Yoshinori [1 ]
机构
[1] Faculty of Engineering, Aichi University of Technology, 50-2 Manori Nishihazama, Gamagori, Aichi 443-0047, Japan
[2] Department of Electrical and Electronic Engineering, Gifu University, Gifu 501-1193, Japan
关键词
The photoconductive characteristics of amorphous titanium oxide films (a-TiOx:OH) prepared by remote plasma-enhanced (RPE) chemical vapor deposition; in inert Ar atmosphere with/without a small amount of oxygen; have been studied. In inert Ar atmosphere without oxygen; the residual decay of photocurrent (long decay time) is observed after removing UV irradiation. On the other hand; in inert Ar atmosphere with a small amount of oxygen; the photocurrent under UV irradiation is influenced strongly by an environmental gas with oxygen gas. The maximum of photocurrent (photosensitivity) is nearly inversely proportional to oxygen partial pressure; suggesting that the present films are useful for sensors of environmental oxygen gases. The decay of photocurrent; after removing UV irradiation; follows a stretched exponential function. The effective decay time τ is nearly inversely proportional to oxygen partial pressure. The results will be discussed in terms of the surface reaction of oxygen gas on the present films. © 2006 The Japan Society of Applied Physics;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
页码:4183 / 4186
相关论文
共 50 条
  • [1] Photoconductive characteristics of hydro-oxygenated amorphous titanium oxide films prepared by remote plasma-enhanced chemical vapor deposition
    Sakaguchi, Koichi
    Shimakawa, Koichi
    Hatanaka, Yoshinori
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (5A): : 4183 - 4186
  • [2] Photocatalytic characteristics of hydro-oxygenated amorphous titanium oxide films prepared using remote plasma enhanced chemical vapor deposition
    Hatanaka, Y
    Naito, H
    Itou, S
    Kando, M
    APPLIED SURFACE SCIENCE, 2005, 244 (1-4) : 554 - 557
  • [3] Hydrophilicity of hydro-oxygenated amorphous TiOx films prepared by plasma enhanced chemical vapor deposition
    Nakamura, Masatoshi
    Sirghi, Lucel
    Aoki, Toru
    Hatanaka, Yoshinori
    Shinku/Journal of the Vacuum Society of Japan, 2003, 46 (02) : 105 - 110
  • [4] Hydrophilic properties of hydro-oxygenated TiOx films prepared by plasma enhanced chemical vapor deposition
    Nakamura, M
    Makino, K
    Sirghi, L
    Aoki, T
    Hatanaka, Y
    SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 699 - 702
  • [5] Determination of photocatalytic activity in amorphous and crystalline titanium oxide films prepared using plasma-enhanced chemical vapor deposition
    Wu, Cheng-Yang
    Chiang, Bo-Sheng
    Chang, Springfield
    Liu, Day-Shan
    APPLIED SURFACE SCIENCE, 2011, 257 (06) : 1893 - 1897
  • [6] Evaluation of photocatalytic properties of titanium oxide films prepared by plasma-enhanced chemical vapor deposition
    Maeda, M
    Watanabe, T
    THIN SOLID FILMS, 2005, 489 (1-2) : 320 - 324
  • [7] Structural properties of amorphous carbon nitride films prepared by remote plasma-enhanced chemical vapor deposition
    Kim, JH
    Kim, YH
    Choi, DJ
    Baik, HK
    THIN SOLID FILMS, 1996, 289 (1-2) : 79 - 83
  • [8] Stress in amorphous SiOx:H films prepared by plasma-enhanced chemical vapor deposition
    He, Le-Nian
    Inokuma, Takao
    Kurata, Yoshihiro
    Hasegawa, Seiich
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (03): : 1873 - 1879
  • [9] Stress in amorphous SiOx:H films prepared by plasma-enhanced chemical vapor deposition
    He, LN
    Inokuma, T
    Kurata, Y
    Hasegawa, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (03): : 1873 - 1879
  • [10] On the mechanism of remote plasma-enhanced chemical vapor deposition of films
    O. V. Polyakov
    A. M. Badalyan
    L. F. Bakhturova
    V. O. Borisov
    High Energy Chemistry, 2008, 42 : 332 - 334