Growth of crystalline silicon by a seed layer approach using plasma enhanced chemical vapor deposition

被引：0
|
作者：
Khelil, M. [1 ]
Kraiem, S. [1 ]
Khirouni, K. [1 ]
Alaya, S. [1 ]
机构：
[1] Laboratoire de Physique des Matériaux et des Nanomatériaux appliquée a l'Environnement, Faculté des Sciences de Gabès, cité Erriadh, Université de Gabès, Gabès,6079, Tunisia
来源：
Physica B: Condensed Matter | 2021年 / 609卷
关键词：
Plasma enhanced chemical vapor deposition;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Deposition of micro crystalline silicon films using microwave plasma enhanced chemical vapor deposition
    Altmannshofer, Stephan
    Miller, Bastian
    Holleitner, Alexander W.
    Boudaden, Jamila
    Eisele, Ignaz
    Kutter, Christoph
    THIN SOLID FILMS, 2018, 645 : 180 - 186
  • [2] Growth control of carbon nanotubes by plasma enhanced chemical vapor deposition
    Sato, Hideki
    Sakai, Takamichi
    Suzuki, Atsushi
    Kajiwara, Kazuo
    Hata, Koichi
    Saito, Yahachi
    VACUUM, 2008, 83 (03) : 515 - 517
  • [3] Growth of carbon nanotubes by plasma-enhanced chemical vapor deposition
    Sato, Hideki
    Hata, Koichi
    NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2006, 16 (03): : 163 - 176
  • [4] Growth characteristics of carbon nanotubes using platinum catalyst by plasma enhanced chemical vapor deposition
    Han, JH
    Choi, SH
    Lee, TY
    Yoo, JB
    Park, CY
    Jung, T
    Yu, SG
    Yi, W
    Han, IT
    Kim, JM
    DIAMOND AND RELATED MATERIALS, 2003, 12 (3-7) : 878 - 883
  • [5] Optical properties and passivation effects of silicon nitride three layer stacks deposited by plasma enhanced chemical vapor deposition
    Kluska, S.
    Hejduk, K.
    Drabczyk, K.
    Lipinski, M.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2016, 213 (07): : 1839 - 1847
  • [6] Plasma enhanced chemical vapor deposition of silicon under relatively high pressure conditions
    Amanatides, E
    Lykas, B
    Mataras, D
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2005, 33 (02) : 372 - 373
  • [7] Advances in plasma-enhanced chemical vapor deposition of silicon films at low temperatures
    Collins, RW
    Ferlauto, AS
    CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, 2002, 6 (05) : 425 - 437
  • [8] Deposition of SiOx layer by plasma-enhanced chemical vapor deposition for the protection of silver (Ag) surfaces
    Al Tarazi, Saad
    Volpe, Luca
    Antonelli, Luca
    Jafer, Rashida
    Batani, Dimitri
    d'Esposito, Antonio
    Vitobello, Marialuisa
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2014, 169 (03): : 217 - 224
  • [9] Mass spectroscopy in plasma-enhanced chemical vapor deposition of silicon-oxide films using tetramethoxysilane
    Inoue, Y
    Takai, O
    THIN SOLID FILMS, 1998, 316 (1-2) : 79 - 84
  • [10] Effective Passivation of Black Silicon Surfaces via Plasma-Enhanced Chemical Vapor Deposition Grown Conformal Hydrogenated Amorphous Silicon Layer
    Ozkol, Engin
    Procel, Paul
    Zhao, Yifeng
    Mazzarella, Luana
    Medlin, Rostislav
    Sutta, Pavol
    Isabella, Olindo
    Zeman, Miro
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2020, 14 (01):
12345