Effects of atomic layer etching on magnetic properties of CoFeB films: Reduction of Gilbert damping
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Konh, Mahsa
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Department of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United StatesDepartment of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United States
Konh, Mahsa
[1
]
Wang, Yang
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Department of Physics and Astronomy, University of Delaware, Newark,DE,19716, United StatesDepartment of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United States
Wang, Yang
[2
]
Pina, Marissa
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Department of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United StatesDepartment of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United States
Pina, Marissa
[1
]
Teplyakov, Andrew V.
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Department of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United StatesDepartment of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United States
Teplyakov, Andrew V.
[1
]
Xiao, John Q.
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Department of Physics and Astronomy, University of Delaware, Newark,DE,19716, United StatesDepartment of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United States
Xiao, John Q.
[2
]
机构:
[1] Department of Chemistry and Biochemistry, University of Delaware, Newark,DE,19716, United States
[2] Department of Physics and Astronomy, University of Delaware, Newark,DE,19716, United States