Direct laser write lithography for high optical quality electrowetting prisms

This study demonstrates the fabrication and evaluation of a monolithic electrowetting prism with a minimized electrode gap. The electrically tunable prism is capable of twodimensional beam steering of approximately +/- 4 degrees under voltage differentials up to +/- 15 V. The main innovation lies in reducing the electrode gap to 30 mu m, accomplished using direct write laser lithography on three dimensional substrates. Through simulations and experimental validation, we show that reducing the gap between electrodes to 30 mu m enables the transmission of a 1.2 mm diameter beam with negligible impact on imaging quality. The improved imaging quality makes electrowetting prisms an attractive option for future advancements in optical scanning technologies.