Thermionic Field Emission in the Lifetime Estimation of p-GaN Gate HEMTs

被引:1
|
作者
Greco, G. [1 ]
Fiorenza, P. [1 ]
Giannazzo, F. [1 ]
Vivona, M. [1 ]
Venuto, C. [2 ]
Iucolano, F. [2 ]
Roccaforte, F. [1 ]
机构
[1] CNR IMM, I-95121 Catania, Italy
[2] STMicroelectronics, I-95121 Catania, Italy
关键词
Logic gates; MODFETs; HEMTs; Stress; Thermionic emission; Current density; Reliability; Gallium nitride; normally-off HEMT; p-GaN; RELIABILITY; TECHNOLOGY; TRANSPORT; PHYSICS;
D O I
10.1109/LED.2024.3438807
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The current transport mechanism at metal gate/p-GaN interface in p-GaN HETMs has been investigated. Space Charge Limited Current (SCLC) well describes the behaviour of current density (J(G)) at lower applied bias (V (G)<6 V), while Thermionic Field Emission (TFE) represents the dominant current mechanism at higher V-G. Then, p-GaN gate reliability was investigated by time-to-failure (TTF) analysis carried out at constant positive V-G. In particular, the devices' lifetime as function of the applied V-G was described considering the J(G)-V-G dependence according the TFE model. In this way, a maximum V-G for 10-year lifetime (V (10years)(Gmax)) of 8.5 V has been estimated, significantly higher than that extracted by conventional E-model (7 V).
引用
收藏
页码:1724 / 1727
页数:4
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