Preliminary Exploration of Low Frequency Low-Pressure Capacitively Coupled Ar-O2 Plasma

被引:1
|
作者
Wali, Niaz [1 ]
Xiao, Weiwen [2 ]
Din, Qayam Ud [3 ]
Rehman, Najeeb Ur [3 ]
Wang, Chiyu [4 ]
Ma, Jiatong [1 ]
Zhong, Wenjie [1 ]
Yang, Qiwei [5 ,6 ]
机构
[1] Zhejiang Univ, Inst Fus Theory & Simulat, Sch Phys, Hangzhou 310058, Peoples R China
[2] Zhejiang Univ Technol, Sch Sci, Hangzhou 310014, Peoples R China
[3] COMSATS Univ, Dept Phys, Plasma Res Lab, Islamabad 45550, Pakistan
[4] Southwestern Inst Phys, Chengdu 610041, Peoples R China
[5] Zhejiang Univ, Coll Chem & Biol Engn, Key Lab Biomass Chem Engn, Minist Educ, Hangzhou 310027, Peoples R China
[6] Inst Zhejiang Univ Quzhou, Quzhou 324000, Peoples R China
基金
中国国家自然科学基金;
关键词
non-thermal; low-pressure Ar-O-2 plasma; single Langmuir probe; electron density; electron temperature; low-frequency AC power supply; PARAMETERS; AR/O-2; OXYGEN; AR;
D O I
10.3390/pr12091858
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Non-thermal plasma as an emergent technology has received considerable attention for its wide range of applications in agriculture, material synthesis, and the biomedical field due to its low cost and portability. It has promising antimicrobial properties, making it a powerful tool for bacterial decontamination. However, traditional techniques for producing non-thermal plasma frequently rely on radiofrequency (RF) devices, despite their effectiveness, are intricate and expensive. This study focuses on generating Ar-O-2 capacitively coupled plasma under vacuum conditions, utilizing a low-frequency alternating current (AC) power supply, to evaluate the system's antimicrobial efficacy. A single Langmuir probe diagnostic was used to assess the key plasma parameters such as electron density (n(e)), electron temperature (T-e), and electron energy distribution function (EEDF). Experimental results showed that n(e) increases (7 x 10(15) m(-3) to 1.5 x 10(16) m(-3)) with a rise in pressure and AC power. Similarly, the EEDF modified into a bi-Maxwellian distribution with an increase in AC power, showing a higher population of low-energy electrons at higher power. Finally, the generated plasma was tested for antimicrobial treatment of Xanthomonas campestris pv. Vesicatoria. It is noted that the plasma generated by the AC power supply, at a pressure of 0.5 mbar and power of 400 W for 180 s, has 75% killing efficiency. This promising result highlights the capability of the suggested approach, which may be a budget-friendly and effective technique for eliminating microbes with promising applications in agriculture, biomedicine, and food processing.
引用
收藏
页数:15
相关论文
共 50 条
  • [21] Diagnostics for low-energy electrons in a two-frequency capacitively coupled plasma in Ar
    Ishimaru, M.
    Ohba, T.
    Ohmori, T.
    Yagisawa, T.
    Kitajima, T.
    Makabe, T.
    APPLIED PHYSICS LETTERS, 2008, 92 (07)
  • [22] Effect of electron Monte Carlo collisions on a hybrid simulation of a low-pressure capacitively coupled plasma
    Hwang, Seok Won
    Lee, Ho-Jun
    Lee, Hae June
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2014, 23 (06):
  • [23] Abnormal heating of low-energy electrons in low-pressure capacitively coupled discharges
    Park, G. Y.
    You, S. J.
    Iza, F.
    Lee, J. K.
    PHYSICAL REVIEW LETTERS, 2007, 98 (08)
  • [24] Dissociation fraction in low-pressure inductively coupled N2-Ar and O2-Ar plasmas
    Lee, Young Wook
    Lee, Hye-lan
    Chung, T. H.
    CURRENT APPLIED PHYSICS, 2011, 11 (05) : S187 - S191
  • [25] Impact of Inhomogeneous Magnetic Fields on Polymer Deposition in Low-Pressure Capacitively Coupled Ar/C4F8 Plasma
    Kim, Jihoon
    Han, Jonggu
    Park, Woojin
    Park, Sang Jun
    Baek, Song Yi
    Yoo, Byeongsun
    Choi, Chulhwan
    Moon, Se Youn
    PLASMA PROCESSES AND POLYMERS, 2024,
  • [26] Axial diagnosis of radio-frequency capacitively coupled Ar/O2 plasma
    Cao Li-Yang
    Ma Xiao-Ping
    Deng Li-Li
    Lu Man-Ting
    Xin Yu
    ACTA PHYSICA SINICA, 2021, 70 (11)
  • [27] Electronegativity of capacitively coupled Ar+O2 plasma excited at very high frequency
    Yang Yu
    Tang Cheng-Shuang
    Zhao Yi-Fan
    Yu Yi-Qing
    Xin Yu
    ACTA PHYSICA SINICA, 2017, 66 (18)
  • [28] The effect of electron induced secondary electrons on the characteristics of low-pressure capacitively coupled radio frequency plasmas
    Horvath, B.
    Schulze, J.
    Donko, Z.
    Derzsi, A.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2018, 51 (35)
  • [29] Argon metastable and resonant densities in a low-pressure Ar-N2 inductively coupled plasma
    Munoz, J.
    Margot, J.
    Chaker, M.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (45)
  • [30] Power dynamics in a low pressure capacitively coupled plasma discharge
    Rauf, Shahid
    Bera, Kallol
    Collins, Ken
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2010, 19 (01):