Electrical and structural investigation of Pt/n-type GaN Schottky contacts: The possible origin of inhomogeneous barrier

被引:0
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作者
Mamor, Mohammed [1 ]
Chauvat, Marie Pierre [2 ]
Ruterana, Pierre [2 ]
机构
[1] Univ Cadi Ayyad, Fac Polydisciplinaire, Lab Phys Fondamentale & Appliquee Safi LPFA Safi, BP 4162, Safi, Marrakech, Morocco
[2] Univ Caen Normandie, CNRS, UMR 6252, CEA,CIMAP,ENSICAEN, 6 Blvd Marechal Juin, F-1400 Caen, France
关键词
Inhomogeneous barrier height; Surface states density; Deep level transient spectroscopy; Point defects; Transmission electron microscope; Threading dislocations; DEEP-LEVEL DEFECTS; DIODES; DEPENDENCE; SAPPHIRE; HEIGHT; GROWTH; BIAS;
D O I
10.1016/j.mseb.2024.117756
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An ideal metal/GaN interface is not usually possible and the surface states are often present at such interface and therefore affect the Schottky barrier diode (SBD) performance. In this work the interface states in Pt/n-type GaN SBD were extracted using temperature dependent forward current-voltage (I I-V V-T) T ) characteristics over a large temperature range (80-400 K). The energy profile distribution of the density of interface states N SS (E) E ) and its dependence on the temperature were determined from the bias and temperature dependence of the measured effective barrier height h0bn(V, 0 bn ( V, T ) and ideality factor n (V, V , T ). It is shown that the interface states density at room temperature decreases with increasing energy with respect to the conduction band. It is shown that the effective Schottky barrier height (SBH) and ideality factor are correlated to the density of interface states. This result suggests that interface states density contributes to barrier inhomogeneities in Pt/n-type GaN SBD. Fourier transform deep level transient spectroscopy (FT-DLTS) has been employed to extract qualitative information about the native defects present in as-grown n-type GaN. From FT-DLTS, two prominent native defects D2 2 and D3 3 were observed in GaN. The defect D2 2 located at E C- 0.56 eV could be associated with impurity at Ga site. The defect D3 3 located at E C- 0.26 eV has been assigned to nitrogen-related energy level. These native defects are interpreted as responsible of the existence of interface states and then to the barrier inhomogeneities at Pt/n-type GaN contacts. Furthermore, other possible origins of the interface states at Pt/n-type GaN interface are discussed in terms of the threading dislocations inside the GaN templates that reach the surface and other possible irregularities at this interface.
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页数:7
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