Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells

被引：0

作者：

Macco, Bart ^{[1
]}

van de Poll, Mike L. ^{[1
]}

van de Loo, Bas W.H. ^{[2
]}

Broekema, Tim M.P. ^{[1
]}

Basuvalingam, Saravana B. ^{[1
]}

van Helvoirt, Cristian A.A. ^{[1
]}

Berghuis, Wilhelmus J.H. ^{[1
]}

Theeuwes, Roel J. ^{[1
]}

Phung, Nga ^{[1
]}

Kessels, Wilhelmus M.M. ^{[1
]}

机构：

[1] Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, Eindhoven,MB,5600, Netherlands

[2] SALD B.V., Zwaanstraat 1, Eindhoven,CA,5651, Netherlands

来源：

Solar Energy Materials and Solar Cells | 2022年 / 245卷

关键词：

Atomic layer deposition;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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[41] Atomic layer deposited ZnO:Al for nanostructured silicon heterojunction solar cells [J].

Steglich, M. ;

Bingel, A. ;

Jia, G. ;

Falk, F. .

SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2012, 103 :62-68

[42] Doped Nickel Oxide Carrier-Selective Contact for Silicon Solar Cells [J].

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Zakaria, Yahya ;

Lambert, Daniel ;

Burr, Patrick ;

Rashkeev, Sergey ;

Abdallah, Amir ;

Hoex, Bram .

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[43] Porous Silicon-Zinc Oxide Nanocomposites Prepared by Atomic Layer Deposition for Biophotonic Applications [J].

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[49] Atomic layer deposition of ultra-thin and smooth Al-doped ZnO for zero-index photonics [J].

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[50] Characteristics of the electromagnetic interference shielding effectiveness of Al-doped ZnO thin films deposited by atomic layer deposition [J].

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