Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells

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作者：
Macco, Bart [1 ]
van de Poll, Mike L. [1 ]
van de Loo, Bas W.H. [2 ]
Broekema, Tim M.P. [1 ]
Basuvalingam, Saravana B. [1 ]
van Helvoirt, Cristian A.A. [1 ]
Berghuis, Wilhelmus J.H. [1 ]
Theeuwes, Roel J. [1 ]
Phung, Nga [1 ]
Kessels, Wilhelmus M.M. [1 ]
机构：
[1] Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, Eindhoven,MB,5600, Netherlands
[2] SALD B.V., Zwaanstraat 1, Eindhoven,CA,5651, Netherlands
来源：
Solar Energy Materials and Solar Cells | 2022年 / 245卷
关键词：
Atomic layer deposition;
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