共 50 条
- [41] Electron-ion coincidence measurements:: The neutral dissociation cross section for CF4 JOURNAL OF CHEMICAL PHYSICS, 1998, 108 (05): : 1910 - 1914
- [48] Enhancement of etch rate by the addition of O2 and Ar in chemical dry etching of Si using a discharge flow of Ar/CF4 and CF4/O2 gas mixtures JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (4A): : 2440 - 2446
- [50] CF4 - CRYSTAL STRUCTURE AND SOLID PHASE DIAGRAM WITH AR JOURNAL OF CHEMICAL PHYSICS, 1969, 51 (10): : 4583 - &