Cross Section Sets and Transport Parameters for Ar+ Ions in Cf4 Gas

被引：0
|
作者：
Nikitović, Željka [1 ]
Raspopović, Zoran [1 ]
机构：
[1] Institute of Physics, University of Belgrade, Pregrevica 118, Belgrade, Serbia
来源：
Science of Sintering | 2024年 / 56卷 / 02期
关键词：
D O I：
10.2298/SOS230326038N
中图分类号：
学科分类号：
摘要：
Semiconductor devices
引用
收藏
页码：223 / 230
相关论文
共 50 条
  • [1] Cross sections set and transport coefficients for Ar+ in Ar/CF4 mixtures
    Nikitovic, Zeljka D.
    Raspopovic, Zoran M.
    Stojanovic, Vladimir D.
    EUROPEAN PHYSICAL JOURNAL D, 2018, 72 (10):
  • [2] Cross sections set and transport coefficients for Ar+ in Ar/CF4 mixtures
    Željka D. Nikitović
    Zoran M. Raspopović
    Vladimir D. Stojanović
    The European Physical Journal D, 2018, 72
  • [3] Rate Coefficients of Ar+ Ions in Ar/CF4 Mixtures
    Nikitovic, Z.
    Stojanovic, V.
    Raspopovic, Z.
    ACTA PHYSICA POLONICA A, 2018, 134 (06) : 1134 - 1136
  • [4] Cross-Section and Transport Parameters of Ne+ in CF4
    Nikitovic, Z.
    Stojanovic, V.
    Raspopovic, Z.
    ACTA PHYSICA POLONICA A, 2016, 130 (06) : 1343 - 1345
  • [5] Effect of exothermic reactions on the mobility of Ar+ in CF4
    Raspopovic, Z.
    Stojanovic, V.
    Nikitovic, Z.
    EPL, 2015, 111 (04)
  • [6] Cross section set and transport properties of Ne+ in CF4
    Raspopovic, Z.
    Nikitovic, Z.
    Tosic, S.
    Stojanovic, V.
    XXIX INTERNATIONAL CONFERENCE ON PHOTONIC, ELECTRONIC, AND ATOMIC COLLISIONS (ICPEAC2015), PTS 1-12, 2015, 635
  • [7] A set of cross sections and transport coefficients for CF3+ ions in CF4
    Jovanovic, J., V
    Stojanovic, V
    Raspopovic, Z.
    de Urquijo, J.
    Petrovic, Z. Lj
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2019, 28 (04):
  • [8] Fluorocarbon ions in oxide contact etching with CF4/Ar plasma
    Choi, CJ
    Kwon, OS
    Seol, YS
    PLASMA PROCESSING XII, 1998, 98 (04): : 157 - 164
  • [9] Effect of attaching gas addition on plasma parameters in inductive Ar/O2 and Ar/CF4 discharges
    Kimura, T
    Takai, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (10): : 7240 - 7248
  • [10] Effect of attaching gas addition on plasma parameters in inductive Ar/O2 and Ar/CF4 discharges
    Kimura, T., 1600, Japan Society of Applied Physics (43):
12345