ITO thin films exhibit superior optical characteristics. However, their electrical properties are somewhat less optimal, and they demonstrate limited tolerance under high-temperature conditions. These limitations significantly constrain their potential applications in the domain of optical and electronic devices. In this study, ITO thin films with a thickness of 20 nm were prepared on a flexible Mica substrate. The film has an atomic-level flat surface, high optical transparency (around 85 %), and low resistivity. The stability of the film's surface chemical structure in high-temperature applications was confirmed through XPS characterization. Furthermore, the ITO/ Mica flexible thin film demonstrates exceptional durability and recyclability, retaining its optical and electronic properties under a high bending radius of 5 mm and 1000 bending cycles. It is particularly noteworthy that the film's maintenance of good structural and electrical stability (sheet resistance stabilized at 35 similar to 37.5 Omega/sq) under bending cycles at high-temperature (up to 800 degrees C) conditions, which is crucial for high-temperature resistance in commercial and industrial applications. This study will provide an important experimental basis for the further development and application of ITO thin films in flexible transparent electronic devices with high temperatures and low energy consumption.