Simulating temporal speckle with prescribed correlation properties in optical lithography

被引:0
作者
Shirai, Tomohiro [1 ]
Arakawa, Masaki [2 ]
Fujimaki, Yousuke [2 ]
Kumazaki, Takahito
Kakizaki, Kouji [2 ]
机构
[1] Natl Metrol Inst Japan NMIJ, Natl Inst Adv Ind Sci & Technol AIST, Cent 2,1-1-1 Umezono, Tsukuba 3058568, Japan
[2] Gigaphoton Inc, Res & Dev Div, Res Dept, 400 Yokokurashinden, Oyama 3238558, Japan
基金
日本学术振兴会;
关键词
FIELDS; COHERENCE; LIMIT;
D O I
10.1364/JOSAA.530912
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We describe a method of simulating temporal speckle often encountered in optical lithography. The first step of the method is to generate numerically optical fields with prescribed temporal coherence properties using a shot noise process. By properly arranging the data for instantaneous intensities calculated from the generated fields, one can construct virtually temporal speckle patterns that satisfy all the necessary conditions. As some illustrative examples, we examine the variation of the temporal speckle contrast as a function of the exposure time of the detector by means of these speckle patterns. Our method would provide an intuitive understanding of hardly observable temporal speckle and serve as an educational tool for students and professionals in optics. (c) 2024 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
引用
收藏
页码:1923 / 1931
页数:9
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