Variability Analysis and Improvement Strategies for Nanoscale Ferroelectric Hf0.5Zr0.5O2 Utilizing Schottky Emission Current in Switchable Diode

被引:1
|
作者
Lee, Kyumin [1 ]
Oh, Sang-Ho [2 ]
Jang, Hojung [1 ]
Lee, Sunhyeong [1 ]
Lee, Byeong-Joo [2 ]
Hwang, Hyunsang [1 ]
机构
[1] Pohang Univ Sci & Technol POSTECH, Ctr Single Atom Based Semicond Device, Dept Mat Sci & Engn, Pohang 37673, South Korea
[2] POSTECH, Dept Mat Sci & Engn, Pohang 37673, South Korea
基金
新加坡国家研究基金会;
关键词
Ferroelectric diode; HZO; Schottky emission; nanoscale; variability; microwave annealing; interfacial layer; FUTURE; PHASE;
D O I
10.1109/LED.2024.3451968
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we proposed a novel variability analysis method in nanoscale ferroelectric Hf-0.Zr-5(0).O-5(2) (HZO) using FE diode. The polarization variability was indirectly evaluated from the variation of Schottky emission (SE) current, which is the dominant conduction mechanism in FE diode. Using this method, we investigated two strategies to improve variability: 1) microwave annealing (MWA) and 2) HfO2 interfacial layer (IL) insertion. Low monoclinic (m-) phase fraction with MWA and scaled HZO grain size with HfO2 IL insertion contribute to the improvement of variability. Effectively reduced thermal budget and improved endurance were also achieved. Our proposed method and strategies demonstrate strong potential for applications in scaled FE memory devices.
引用
收藏
页码:2078 / 2081
页数:4
相关论文
共 50 条
  • [21] Resolving Mechanical Properties and Morphology Evolution of Free-Standing Ferroelectric Hf0.5Zr0.5O2
    Tharpe, Troy
    Zheng, Xu-Qian
    Feng, Philip X-L
    Tabrizian, Roozbeh
    ADVANCED ENGINEERING MATERIALS, 2021, 23 (12)
  • [22] Flexible Hf0.5Zr0.5O2 ferroelectric thin films on polyimide with improved ferroelectricity and high flexibility
    Yuting Chen
    Yang Yang
    Peng Yuan
    Pengfei Jiang
    Yuan Wang
    Yannan Xu
    Shuxian Lv
    Yaxin Ding
    Zhiwei Dang
    Zhaomeng Gao
    Tiancheng Gong
    Yan Wang
    Qing Luo
    Nano Research, 2022, 15 : 2913 - 2918
  • [23] Improved Ferroelectric/Semiconductor Interface Properties in Hf0.5Zr0.5O2 Ferroelectric FETs by Low-Temperature Annealing
    Toprasertpong, Kasidit
    Tahara, Kento
    Fukui, Taichiro
    Lin, Zaoyang
    Watanabe, Kouhei
    Takenaka, Mitsuru
    Takagi, Shinichi
    IEEE ELECTRON DEVICE LETTERS, 2020, 41 (10) : 1588 - 1591
  • [24] Symmetry Engineering of Epitaxial Hf0.5Zr0.5O2 Ultrathin Films
    De, Arnab
    Jung, Min-Hyoung
    Kim, Young-Hoon
    Bae, Seong Bin
    Jeong, Seung Gyo
    Oh, Jin Young
    Choi, Yeongju
    Lee, Hojin
    Kim, Yunseok
    Choi, Taekjib
    Kim, Young-Min
    Yang, Sang Mo
    Jeong, Hu Young
    Choi, Woo Seok
    ACS APPLIED MATERIALS & INTERFACES, 2024, 16 (21) : 27532 - 27540
  • [25] CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
    Yu, Zhouchangwan
    Saini, Balreen
    Liao, Pei-Jean
    Chang, Yu-Kai
    Hou, Duen-Huei
    Nien, Chih-Hung
    Shih, Yu-Chuan
    Yeong, Sai Hooi
    Afanas'ev, Valeri
    Huang, Fei
    Baniecki, John D.
    Mehta, Apurva
    Chang, Chih-Sheng
    Wong, H-S Philip
    Tsai, Wilman
    McIntyre, Paul C.
    ADVANCED ELECTRONIC MATERIALS, 2022, 8 (07)
  • [26] Epitaxial Ferroelectric Hf0.5Zr0.5O2 Thin Films and Their Implementations in Memristors for Brain-Inspired Computing
    Yoong, Herng Yau
    Wu, Haijun
    Zhao, Jianhui
    Wang, Han
    Guo, Rui
    Xiao, Juanxiu
    Zhang, Bangmin
    Yang, Ping
    Pennycook, Stephen John
    Deng, Ning
    Yan, Xiaobing
    Chen, Jingsheng
    ADVANCED FUNCTIONAL MATERIALS, 2018, 28 (50)
  • [27] Solution processed high performance ferroelectric Hf0.5Zr0.5O2 thin film transistor on glass substrate
    Hasan, Md. Mehedi
    Ahn, Chang Won
    Kim, Tae Heon
    Jang, Jin
    APPLIED PHYSICS LETTERS, 2021, 118 (15)
  • [28] The Investigation of Reduced Variation Effectin FinFETs With Ultrathin 3-nm Ferroelectric Hf0.5Zr0.5O2
    Zhang, Fan
    Zhang, Zhaohao
    Yao, Jiaxin
    Zhu, Xiaohui
    Peng, Yue
    Huo, Jiali
    Zhang, Qingzhu
    Xu, Gaobo
    Wu, Zhenhua
    Han, Genquan
    Liu, Yan
    Yin, Huaxiang
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (05) : 2876 - 2880
  • [29] Back-end-of-line compatible Hf0.5Zr0.5O2 ferroelectric devices enabled by microwave annealing
    Liu, Yinchi
    Zhang, Hao
    Yang, Jining
    Golosov, Dmitriy Anatolyevich
    Wu, Xiaohan
    Gu, Chenjie
    Ding, Shijin
    Liu, Wenjun
    CHIP, 2025, 4 (01):
  • [30] Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2 Thin Films
    Park, Min Hyuk
    Kim, Han Joon
    Kim, Yu Jin
    Moon, Taehwan
    Do Kim, Keum
    Lee, Young Hwan
    Hyun, Seung Dam
    Hwang, Cheol Seong
    ADVANCED MATERIALS, 2016, 28 (36) : 7956 - 7961