On the dislocation storage capacity of additively manufactured Hastelloy X: In situ synchrotron diffraction study

被引：0
|
作者：
Prasad, Kartik [1 ]
Ito, Atsushi [2 ]
Torizuka, Shiro [2 ]
机构：
[1] Defence Metallurgical Research Laboratory, Hyderabad, India
[2] Department of Synchrotron Radiation & Materials Engineering, University of Hyogo, Himeji, Japan
来源：
Materials Characterization | 2024年 / 218卷
关键词：
Compendex;
D O I：
10.1016/j.matchar.2024.114573
中图分类号：
学科分类号：
摘要：
Chemical industry
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