376 nm High-Power UV-A Laser Diodes With GaN Waveguide

被引:0
作者
Lin, Qinchen [1 ]
Liu, Cheng [1 ]
Wang, Guangying [1 ]
Sanyal, Surjava [1 ]
Dwyer, Matthew [2 ]
Seitz, Matthew [3 ]
Chen, Jiahao [1 ]
Li, Yuting [1 ]
Earles, Tom [2 ]
Tansu, Nelson [4 ]
Zhang, Jing [3 ]
Mawst, Luke [1 ]
Gupta, Chirag [1 ]
Pasayat, Shubhra S. [1 ]
机构
[1] Univ Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
[2] DRS Daylight Solut, Madison, WI 53704 USA
[3] Rochester Inst Technol, Dept Elect & Microelect Engn, Rochester, NY 14623 USA
[4] Univ Adelaide, Sch Elect & Mech Engn, Adelaide, SA 5005, Australia
关键词
Absorption; Gallium nitride; Quantum well devices; Optical refraction; Refractive index; Optical waveguides; Power generation; Optical losses; Wavelength measurement; Substrates; III-Nitride; UVA laser diodes; high power; ULTRAVIOLET; LAYER; MG;
D O I
10.1109/LPT.2024.3488037
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Early studies suggest that absorption coefficient of GaN exceeds 100 cm(-1) at wavelengths below 380 nm, indicating GaN might not be suitable as a waveguide (WG) material for laser diodes (LDs) in this range. However, in those studies, material defects (rather than GaN band edge absorption) could contribute significantly to the measured absorption loss. In this work, III-Nitride LDs emitting at 376 nm using unintentionally doped GaN WG was demonstrated for high-power operation. Devices with a cavity length of 750 mu m and a ridge width of 1 mu m exhibited a threshold current of 625 mA and a slope efficiency of 1.13 W/A under pulsed conditions. The highest output power of 3.4 W was obtained at an injection current of 3.5 A. These promising results suggest that GaN band edge absorption may not be as significant at 376 nm or even shorter wavelengths, allowing more flexibility in epitaxial design.
引用
收藏
页码:1449 / 1452
页数:4
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