Electron Cyclotron Resonance Plasma Studies Using the Second Cyclotron Harmonic Resonance

被引：0
作者：
Kovalchuk, A.V. [1 ]
Shapoval, S.Y. [1 ]
机构：
[1] Institute of Microelectronics Technology and High-Purity Materials, Russian Academy of Sciences, Chernogolovka
来源：
Russian Microelectronics | 2024年 / 53卷 / 05期
关键词：
ECR plasma; EHF interferometry; microwave radiation; plasma probe; second cyclotron harmonic;
D O I：
10.1134/S1063739724600353
中图分类号：
学科分类号：
摘要：
Abstract: Microwave plasma (generation frequency 2.45 GHz, power 200–1000 W, pressure 0.2–10 mTorr) is excited and maintained in two main modes: (1) at continuous microwave power and low magnetic fields (B = 300–450 G) under a superdense (Ne > Ncr = 7.4 × 1010 cm−3) plasma and low plasma density (Ne < Ncr); and (2) in high magnetic fields (B = 750–1000 G), close to the ECR condition. The peculiarities of plasma generation under the ECR condition and at the second harmonic of cyclotron resonance are studied. © Pleiades Publishing, Ltd. 2024. ISSN 1063-7397, Russian Microelectronics, 2024, Vol. 53, No. 5, pp. 433–438. Pleiades Publishing, Ltd., 2024.
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页码：433 / 438
页数：5
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