Epitaxial growth and band offsets of β-(ScxGa1<bold>-</bold>x)2O3 thin films grown on (100) β-Ga2O3 substrate

被引:0
|
作者
Koreishi, Kazuki [1 ]
Soma, Takuto [1 ]
Kumigashira, Hiroshi [2 ,3 ]
Ohtomo, Akira [1 ]
机构
[1] Tokyo Inst Technol, Dept Chem Sci & Engn, Tokyo 1528552, Japan
[2] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Sendai 9808577, Japan
[3] High Energy Accelerator Res Org, Photon Factory, Inst Mat Struct Sci, Tsukuba 3050801, Japan
基金
日本学术振兴会;
关键词
PHASE-TRANSFORMATION; TRANSITIONS; MECHANISM; OXIDES; AL2O3; GA2O3;
D O I
10.1063/5.0226675
中图分类号
O59 [应用物理学];
学科分类号
摘要
beta-(ScxGa1-x)(2)O-3 (x = 0-0.36) thin films were epitaxially grown on (100) beta-Ga2O3 substrates by oxygen-radical-assisted pulsed-laser deposition. beta-(ScxGa1-x)(2)O-3 epilayers were coherently strained up to x = 0.30, although the presence of a structural disorder was implied when x > 0.2. The bandgap energies measured by reflection electron energy loss spectroscopy increased from 4.56 to 5.25 eV with increasing Sc content. In beta-(ScxGa1-x)(2)O-3 epilayers, a slightly negative bandgap bowing behavior with a bowing parameter of -0.4 eV was observed, resulting in a larger bandgap increase than in beta-(AlxGa1-x)(2)O-3 epilayers with identical x. X-ray photoemission spectroscopy measurement revealed that the valence-band and conduction-band offsets of beta-(Sc0.17Ga0.83)(2)O-3 epilayer with respect to beta-Ga2O3 were 0.0 and 0.3 eV, respectively.
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页数:6
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