A comparative study of total and partial ionization cross sections, branching ratios and fragmentation patterns of XH4 (X = C, Si, Ge, Sn, Pb)

被引:1
作者
Song, Yunliang [1 ]
Ma, Yuwei [1 ]
Li, Bowen [1 ]
Chen, Ximeng [1 ]
机构
[1] Lanzhou Univ, Sch Nucl Sci & Technol, Lanzhou 730000, Peoples R China
基金
中国国家自然科学基金;
关键词
partial ionization cross section; fragmentation pattern; binary encounter bethe (BEB); ELECTRON-IMPACT IONIZATION; DISSOCIATIVE IONIZATION; CH4; MOLECULES; SILANE;
D O I
10.1088/1402-4896/ad8112
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The formation and decomposition of SnH4 has been recently reported using electron ionization mass spectrometry (J. Am. Soc. Mass Spectrom. 35 (2024) 1523 and J. Vac. Sci. Technol. A 41 (2023) 063209) due to its importance in tin contamination cleaning in extreme ultraviolet lithography. A comprehensive understanding of the fragment patterns of SnH4 requires total and partial ionization cross sections of SnH4. However, there is limited availability of experimental and theoretical ionization data for SnH4. We report the electron-impact ionization fragmentation patterns of XH4 (X = C, Si, Ge, Sn, Pb) and should provide missing data, especially for SnH4 and PbH4. Total ionization cross sections are calculated using the Binary Encounter Bethe (BEB) method. Partial ionization cross sections and branching ratios are determined using mass spectrum data (MSD) and Huber et al's method. Finally, we compare the calculated percentage abundances for the fragments of XH4 with experimental measurements.
引用
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页数:12
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[1]   Electron-impact total ionization cross sections of silicon and germanium hydrides [J].
Ali, MA ;
Kim, YK ;
Hwang, W ;
Weinberger, NM ;
Rudd, ME .
JOURNAL OF CHEMICAL PHYSICS, 1997, 106 (23) :9602-9608
[2]   A binary-encounter-Bethe approach to compute electron-impact partial ionization cross sections of plasma relevant molecules such as hexamethyldisiloxane and silane [J].
Arora, Ajay Kumar ;
Gupta, Krishna Kumar ;
Goswami, Kanupriya ;
Bharadvaja, Anand ;
Baluja, Kasturi Lal .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (01)
[3]   Dissociative ionization of silane by electron impact [J].
Basner, R ;
Schmidt, M ;
Tarnovsky, V ;
Becker, K ;
Deutsch, H .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 1997, 171 (1-3) :83-93
[4]   Photons, electrons, and acid yields in EUV photoresists:: A progress report [J].
Brainard, Robert ;
Hassanein, Elsayed ;
Li, Juntao ;
Pathak, Piyush ;
Thiel, Brad ;
Cerrina, Franco ;
Moore, Richard ;
Rodriguez, Miguel ;
Yakshinskiy, Boris ;
Loginova, Elena ;
Madey, Theodore ;
Matyi, Richard ;
Malloy, Matt ;
Rudack, Andrew ;
Naulleau, Patrick ;
Wuest, Andrea ;
Dean, Kim .
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2, 2008, 6923
[5]   Electron attachment properties of c-C4F8O in different environments [J].
Chachereau, A. ;
Fedor, J. ;
Janeckova, R. ;
Kocisek, J. ;
Rabie, M. ;
Franck, C. M. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (37)
[6]   TOTAL AND PARTIAL ELECTRON COLLISIONAL IONIZATION CROSS-SECTIONS FOR CH4, C2H6, SIH4, AND SI2H6 [J].
CHATHAM, H ;
HILS, D ;
ROBERTSON, R ;
GALLAGHER, A .
JOURNAL OF CHEMICAL PHYSICS, 1984, 81 (04) :1770-1777
[7]   ELECTRON-IMPACT TOTAL IONIZATION CROSS-SECTIONS FOR METHANE, ETHANE AND PROPANE [J].
DURIC, N ;
CADEZ, I ;
KUREPA, M .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1991, 108 (01) :R1-R10
[8]  
Frisch M. J., 2009, GAUSSIAN 09 REVISION
[9]   Comparison of Different Theory Models and Basis Sets in the Calculations of Structures and 13C NMR Spectra of [Pt(en)(CBDCA-O, O')], an Analogue of the Antitumor Drug Carboplatin [J].
Gao, Hongwei ;
Wei, Xiujuan ;
Liu, Xuting ;
Yan, Tingxia .
JOURNAL OF PHYSICAL CHEMISTRY B, 2010, 114 (11) :4056-4062
[10]   Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization [J].
Garza, Raquel ;
Bartlett, Nathan ;
Crouse, Jameson ;
Herschberg, Andrew ;
Sankaran, R. Mohan ;
Hossain, Md. Amzad ;
Ruzic, David N. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2023, 41 (06)