Molecular dynamics modelling of water nanodroplet impingement on silicon dioxide and silicon nitride substrates

被引：4

作者：

Desai, Salil ^{[1
]}

Kaware, Ravindra D. ^{[2
]}

机构：

[1] Department of Industrial and Systems Engineering, North Carolina A and T State University, 423 McNair Hall, 1601 E. Market Street, Greensboro, 27411, NC

[2] 2301 R Street, Auburn, 68305, NE

来源：

International Journal of Nanomanufacturing | 2014年 / 10卷 / 5-6期

基金：

美国国家科学基金会;

关键词：

Direct-write technology; Molecular dynamics; Nanodroplet impingement; Nanomanufacturing; Substrate wetting;

D O I：

10.1504/IJNM.2014.066281

中图分类号：

学科分类号：

摘要：

This paper reports the study of a droplet-based scalable micro/nanomanufacturing process using molecular dynamics (MD) modelling. The objective of the study is to understand the nanodroplet impingement and spreading mechanism on silicon dioxide (SiO2) and silicon nitride (Si3N4) substrates with different impingement velocities. The dependence of dynamic contact angle on the initial droplet velocity was investigated for hydrophilic and hydrophobic substrate interactions. Higher rebound effect and thereby slower wetting rates were observed for the SiO2-water system as compared to the Si3N4-water system for the same magnitudes of impingement velocities. The MD simulation results were validated using the molecular kinetic theory. Findings of this research are expected to establish the required process controls in droplet-based scalable nanomanufacturing for precision deposition of nanoscale features. Copyright © 2014 Inderscience Enterprises Ltd.

引用

页码：432 / 452

页数：20

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