Effect of slurries on chemical mechanical polishing of decorative glasses by fixed-abrasive pad

被引：0
作者：
Ju, Zhi-Lan [1 ,2 ]
Zhu, Yong-Wei [1 ]
Wang, Jian-Bin [1 ]
Fan, Ji-Long [1 ]
Li, Jun [1 ]
机构：
[1] Jiangsu Province Key Laboratory of Precision and Micro-Manufacturing Technology, College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics
[2] School of Mechanical Engineering, Nantong University
来源：
Guangxue Jingmi Gongcheng/Optics and Precision Engineering | 2013年 / 21卷 / 04期
关键词：
Chemical mechanical polishing; Fixed-abrasive; Material removal rate; Micro-hardness; Polishing slurry; Softened layer;
D O I：
10.3788/OPE.20132104.0955
中图分类号：
学科分类号：
摘要：
In chemical mechanical polishing by a fixed-abrasive pad, the hydrolysis between workpiece and slurries will form a softened layer on the glass substrate to effect on the Material Removal Rate (MRR) and surface quality. The influence of polishing slurries on the surface hardness of decorative glass is analyzed by the micro-hardness method in this paper. The effects of different slurries and temperatures on the MRR were investigated using a CP-4 lapping and polishing platform. Both the dynamic Acoustic Emission (AE) and Coefficient of Friction (COF) were continuously monitored in-situ during the polishing process. The results show that the network structure on the decorative glass surface is collapsed when the sodium hexametaphosphate was added to the slurries, and this layer is softer than the glass, which improved the material removal rate. With the temperature increased, the hydrolysis effect is more obviously. Direct real-time monitoring of AE and COF can offer constructive significance for optimizing process parameters of polishing.
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页码：955 / 962
页数：7
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