The performance comparisons among the shewhart, ewma and cusum control charts for monitoring the critical dimension in a photolithography process

被引：0

作者：

Shao, Yuehjen E. ^{[1
]}

Huang, Hsiao-Yun ^{[1
]}

Chan, Ya-Chi ^{[1
]}

Chen, Yong-Cyuan ^{[1
]}

机构：

[1] Department of Statistics and Information Science, Fu Jen Catholic University, No. 510, Chung Cheng Rd, Hsinchuang Dist., New Taipei City 24205, Taiwan

来源：

ICIC Express Letters | 2012年 / 6卷 / 06期

关键词：

Flowcharting - Statistical process control - Photolithography - Semiconductor device manufacture;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

In recent years, the collection of process observation has become a primary task to verify the status of a process for the semiconductor industry. Specifically, the photolithography process has applied Shewhart type of control charts to monitor the quality characteristic of critical dimension (CD). The difficulty of photolithography process is the light-sensitive deviation between the inter-batches of photo-resist which often causes the shifts of CD. In addition, due to the advanced technology, the CD of the photolithography process becomes smaller. This would cause the difficulty of monitoring, too. In contrast to using the typical Shewhart control charts, this study applies exponentially weighted moving average (EWMA) and cumulative sum (CUSUM) control charts to monitor the CD of the photolithography process. A real data set is collected from a certain semi-conductor company. The performance of the proposed control charts and the existing Shewhart control chart is compared and discussed. © 2012 ICIC International.

引用

页码：1477 / 1481