Interaction of amorphous Si and crystalline Al thin films during low-temperature annealing in vacuum

被引：0
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作者：
Zhao, Y.H. [1 ]
Wang, J.Y. [1 ]
Mittemeijer, E.J. [1 ]
机构：
[1] Max Planck Inst. for Metals Research, Heisenbergstr. 3, D-70569 Stuttgart, Germany
来源：
Thin Solid Films | 1600年 / 1-2 SPEC.卷 / 82-87期
关键词：
Compendex;
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摘要：
Aluminum - Amorphous films - Annealing - Crystalline materials - Low temperature effects - Silicon
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