Oxygen-induced barrier failure in Ti-based self-formed and Ta/TaN barriers for Cu interconnects

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Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan [1 ]
不详 [2 ]
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Jpn. J. Appl. Phys. | / 4 PART 2卷
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Compendex;
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04DB06
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摘要：
Oxygen
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