Ti/TiN multilayer coatings: Deposition technique, characterization and mechanical properties

被引:0
|
作者
Dück, A. [1 ]
Gamer, N. [1 ]
Gesatzke, W. [1 ]
Griepentrog, M. [1 ]
Österle, W. [1 ]
Sahre, M. [1 ]
Urban, I. [1 ]
机构
[1] Federal Institute for Materials Research and Testing (BAM), Berlin, Germany
关键词
Hardness testing - Indentation - Physical vapor deposition - Plastic films - Sputtering - Substrates - Thickness control - Titanium nitride - Transmission electron microscopy - X ray diffraction analysis;
D O I
10.1016/s0257-8972(01)01171-9
中图分类号
学科分类号
摘要
Ti/TiN multilayer coatings with multilayer periods in the range 5-50 nm and a final thickness of 2 μm were deposited on steel substrates by cyclic modulation of nitrogen gas flow into the chamber of a PVD sputtering device. Coating characterization was performed by cross-sectional transmission electron microscopy, glancing-angle X-ray diffraction and instrumental indentation testing. Individual α-titanium and titanium nitride layers were always observed, although for the finer microstructures, the TiN layers were thicker than the Ti layers by a factor three. The plastic hardness of the films increased steadily with decreasing layer spacing, following a Hall-Petch relationship. Finally, a hardness value of 42 GPa was reached, which is similar to that of a thick TiN monolayer, prepared under the same coating conditions. © 2001 Elsevier Science B.V. All rights reserved.
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页码:579 / 584
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