Optimization of measurement configuration in optical scatterometry for one-dimensional nanostructures based on sensitivity analysis

被引：0
|
作者：
Dong Z.-Q. [1 ]
Liu S.-Y. [1 ]
Chen X.-G. [1 ]
Shi Y.-T. [1 ]
Zhang C.-W. [1 ]
Jiang H. [1 ]
机构：
[1] State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan
来源：
Chen, Xiu-Guo (xiuguochen@hust.edu.cn) | 2016年 / Chinese Optical Society卷 / 35期
基金：
中国国家自然科学基金; 中国博士后科学基金;
关键词：
Measurement configuration; Optical scatterometry; Precision; Sensitivity analysis;
D O I：
10.11972/j.issn.1001-9014.2016.01.019
中图分类号：
学科分类号：
摘要：
In optical scatterometry, the sensitivity has a significant impact on the precision of the extracted structral parameters in addition to the quality of the measured signatures. As the sensitivity of structural parameters can be improved with the proper selection of measurement configuration (a combination of wavelengths, incidence, and azimuthal angles), we proposed a method to determine an optimal one for optical scatterometry based on sensitivity analysis. Experiments performed on a one-dimensional periodic grating show agreement between the theoretically predicted and experimentally obtained optimal measurement configurations, which demonstrates the validity of the proposed optimization method. © 2016, Chinese Optical Society. All right reserved.
引用
收藏
页码：116 / 122
页数：6
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