Combining High Thermal Stability of MnNi Antiferromagnets With High-Performance MgO-TMR Sensors Through Texture Engineering With Ion Beam Assisted Deposition

被引:0
作者
Araujo, Pedro D. R. [1 ,2 ]
Macedo, Rita [1 ]
Pereira, Marta [1 ]
Fernandes, Tiago P. [1 ]
Cardoso, Susana [1 ,2 ]
机构
[1] Inst Engn Sistemas E Computadores Microsistemas &, Lisbon P-, Portugal
[2] Univ Lisbon, Inst Super Tecn, P-1000029 Lisbon, Portugal
关键词
Sensors; Temperature sensors; Nonhomogeneous media; Magnetic sensors; Films; Tunneling magnetoresistance; Sensitivity; Ion beams; Sensor phenomena and characterization; Annealing; exchange bias; ion beam assisted deposition (IBAD); MnNi antiferromagnet (AFM); tunneling magnetoresistive (TMR) sensors; BLOCKING TEMPERATURE DISTRIBUTION; MAGNETIC TUNNEL-JUNCTIONS; STRUCTURAL CHARACTERISTICS; SPIN VALVES; FIELD; IMPACT;
D O I
10.1109/LSENS.2024.3482120
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Tunneling magnetoresistive (TMR) sensors with enhancedthermal resilience are being pursued for harsh environmentapplications. In this letter, we explore MnNi as a possible candidatefor exchange bias in TMR sensor multilayers. We use ion beamassisted deposition for MnNi layer growth. A significant emergence ofexchange bias field of mu 0Hex=110 mT was obtained in MnNi/CoFebilayers against the ion beam deposited counterpart. In addition, wedemonstrate for the first time in literature the compatibility with state-of-the-art sensor multilayers comprising syntheticantiferromagnets and MgO tunnel barriers. The optimized device shows a tunneling magnetoresistance ratio of 130%atRT and a 30%at 300 degrees C corresponding to sensitivities of 17.0 and 9.5%/mT with well-defined parallel/antiparallel plateausin the full-temperature operation window.
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页数:4
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