Silicide-induced stress in Si: Origin and consequences for MOS technologies

被引：0
|
作者：
Steegen, An [1 ,2 ]
Maex, Karen [1 ,2 ]
机构：
[1] IMEC, Kapeldreef 75, 3001 Leuven, Belgium
[2] E.E. Department, K.U. Leuven, Leuven, Belgium
来源：
Materials Science and Engineering: R: Reports | 2002年 / 38卷 / 01期
关键词：
Metal alloys - Silicides;
D O I：
10.1016/s0927-796x(02)00006-2
中图分类号：
学科分类号：
摘要：
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页码：1 / 53
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